IC Fabrication Handwritten Notes PDF
Date: 27th Jan 2023
In these “IC Fabrication Handwritten Notes pdf”, we will study a first-hand account of how the Semiconducting Devices are fabricated. It deals with various fabrication processes that go into the making of a single device in detail. Various optical, electrical, and structural characterization techniques are discussed in detail. It gives an overall insight into the process requirements for the device made, their integration, and control at the micro/nano level.
We have provided multiple complete Semiconductor Fabrication and Characterization Notes PDF for any university student of Bachelor of Science BSc Electronics Hons or MSc Electronics to enhance more knowledge about the subject and to score better marks in the exam. Students can easily make use of all these Semiconductor Fabrication and Characterization Notes PDF by downloading them.
Topics in our IC Fabrication Handwritten Notes PDF
The topics we will cover in these IC Fabrication Handwritten Notes PDF will be taken from the following list:
Introduction of Semiconductor Process Technology (Line width – 10 nm technology), Semiconductor materials, single crystal, polycrystalline and amorphous, Crystal growth techniques: Si from the Czochralski technique, starting material, Distribution of dopants, Effective Segregation Coefficient. Silicon Float Zone Process, GaAs from Brigdman techniques. Wafer preparation.
Epitaxy Deposition: Epitaxial growth by vapor phase epitaxy (VPE) and molecular beam epitaxy (MBE).
Characterization: Various characterization methods for structural, electrical, and optical properties. Basic idea of X-ray diffractometer, Scanning electron microscope, Transmission electron microscope, and UV-VIS-NIR spectrophotometer.
Oxidation: Thermal Oxidation Process: Kinetics of Growth for thick and thin Oxide, Dry and Wet oxidation. Effects of high pressure and impurities, Impurity Redistribution during Oxidation, Masking property of Silicon Oxide, Oxide Quality, Chemical vapour deposition of silicon oxide, properties of silicon oxide, step coverage, P-glass flow.
Diffusion: Basic Diffusion Process: Diffusion Equation, Diffusion Profiles. Extrinsic Diffusion Concentration Dependent Diffusivity, Lateral Diffusion, Doping through Ion Implantation, and its comparison with diffusion.
Lithographic Processes: Clean room, Optical lithography, exposure tools, masks, Photoresist, Pattern Transfer, Resolution Enhancement Technique. Electron Beam Lithography, X-ray Lithography, and Ion Beam Lithography. Comparison between various lithographic techniques.
Etching: Wet Chemical Etching-basic process and few examples of etchants for semiconductors, insulators, and conductors; Dry etching using plasma etching technique.
Metallization: Uses of Physical Vapor Deposition and Chemical Vapor Deposition technique for Aluminum and Copper Metallization.
Process Integration: Passive components- Integrated Circuit Resistor, Integrated Circuit Inductor, Integrated Circuit Capacitor. Bipolar Technology: Basic fabrication process, Isolation techniques. MOSFET Technology: Basic fabrication process of NMOS, PMOS, and CMOS technology.
IC Fabrication Handwritten Notes PDF
Semiconductor Fabrication Books List
We have listed the best Semiconductor Fabrication Books that can help in your Semiconductor Fabrication and Characterization exam preparation:
- Gary S.May and S.M.Sze , Fundamentals of Semiconductor Fabrication, John Wiley& Sons(2004).
- Ludmila Eckertova, Physics of Thin films, 2nd Edition, Plenum Press (1986).
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Author: Delhi University